High Energy X-ray Photoelectron Spectroscopy
By setting the beamline to varying energies, X-ray photoelectron spectroscopy (XPS) can be performed at different depths on the same sample, providing information on both surface and bulk properties of the material.
Capabilities
- Ultra high vacuum
- Motorized sample stage
- Bulk Sensitive
- By changing the beam energy from 1.7 to 9.0 keV, users are able Capable of profiling samples from the surface up to 10-20 nm deep (depending on the elements in the sample) by changing the beam energy from 1.7 to 9.0 keV
- Monitoring the growth of thin films using RHEED system
- Auger yield
Samples
- Powders
- Bulk Samples
- Foils
- Thin Films
Specification
- Beam Energy: 1.7 - 9.0 keV
- Analyzer: Photoelectron kinetic energy 5 - 10 keV
- Ion gun (Ar) for cleaning the surfaces of substrate and sample
- 4-pocket mini electron beam evaporator for metal deposition
- Including heating and cooling
